Electroless and electro-plating of Cu on Si
- 1 January 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 33 (1-4) , 59-64
- https://doi.org/10.1016/s0167-9317(96)00031-7
Abstract
No abstract availableKeywords
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- Anodic dissolution of p- and n-type siliconJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1990
- Selective Electroless Metal Deposition for Integrated Circuit FabricationJournal of the Electrochemical Society, 1989
- The electrochemical behaviour of n‐type silicon (111)‐surfaces in fluoride containing aqueous electrolytesBerichte der Bunsengesellschaft für physikalische Chemie, 1987