The use of fast heavy ions to improve thin film adhesion
- 1 September 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 107 (1) , 89-98
- https://doi.org/10.1016/0040-6090(83)90011-1
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Ion-beam-enhanced adhesion in the electronic stopping regionNuclear Instruments and Methods in Physics Research, 1982
- The velocity dependence of fast heavy-ion induced desorption of biomoleculesRadiation Effects and Defects in Solids, 1982
- Sputtering of uranium tetrafluoride in the electronic stopping regionRadiation Effects, 1980
- "Sputtering" of Ice by MeV Light IonsPhysical Review Letters, 1978
- New approach to the mass spectroscopy of non-volatile compoundsBiochemical and Biophysical Research Communications, 1974
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- Measurement of adhesion of thin filmsProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1960