EASE--An Application-Based CAD System for Process Design
- 1 November 1987
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
- Vol. 6 (6) , 1032-1038
- https://doi.org/10.1109/tcad.1987.1270344
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- The design of the REXX languageIBM Systems Journal, 1984
- A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithographyIEEE Transactions on Electron Devices, 1979