Structural and micro-mechanical studies of CNx films deposited on silicon substrates in a remote nitrogen plasma
- 1 September 1999
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 116-119, 59-64
- https://doi.org/10.1016/s0257-8972(99)00069-9
Abstract
No abstract availableKeywords
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