Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
- 1 January 1994
- journal article
- Published by Walter de Gruyter GmbH in Pure and Applied Chemistry
- Vol. 66 (6) , 1373-1380
- https://doi.org/10.1351/pac199466061373
Abstract
Advances are presented in the study of chemical composition, properties and deposition mechanism of thin films deposited via RF glow discharges fed with oxygen and/or silicon-containing organic monomers. The effect of substrate temperature, ion-bombardment, and feed O2/Monomer ratio are described. A general deposition mechanism is proposedKeywords
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