Silicon Homoepitaxy by Rapid Thermal Processing Chemical Vapor Deposition (RTPCVD)—A Review

• 1 April 1991
• journal article
• review article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 138  (4) , 1188-1207
• https://doi.org/10.1149/1.2085739

Abstract

Keywords

• RAPID THERMAL PROCESSING