The angular variation of the sputter yield peak for silica glass targets
- 1 January 1977
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 48 (1) , 434-436
- https://doi.org/10.1063/1.323352
Abstract
A relation based on ion reflection at a surface atom plane is shown to be capable of predicting the angular position of the maxima of the sputter yield curve for silica glass targets under bombardment by ions in the energy range 3–50 keV for 19 different ion-ion energy combinations.This publication has 23 references indexed in Scilit:
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