Carbonized layer formation in ion implanted photoresist masks
- 1 March 1985
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 7-8, 501-506
- https://doi.org/10.1016/0168-583x(85)90421-5
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- High Dose Ion Implantation into PhotoresistJournal of the Electrochemical Society, 1978