Simultaneous planar growth of amorphous and crystalline Ni silicides
- 21 November 1988
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 53 (21) , 2033-2035
- https://doi.org/10.1063/1.100494
Abstract
We report a solid-state interdiffusion reaction induced by rapid thermal annealing and vacuum furnace annealing in evaporated Ni/Si bilayers. Upon heat treatment of a Ni film overlaid on a film of amorphous Si evaporated from a graphite crucible, amorphous and crystalline silicide layers grow uniformly side by side as revealed by cross-sectional transmission electron microscopy and backscattering spectrometry. This phenomenon contrasts with the silicide formation behavior previously observed in the Ni-Si system, and constitutes an interesting counterpart of the solid-state interdiffusion-induced amorphization in Ni/Zr thin-film diffusion couples. Carbon impurity contained in the amorphous Si film stabilizes the amorphous phase. Kinetic and thermodynamic factors that account for the experimental findings are discussed.Keywords
This publication has 17 references indexed in Scilit:
- Solid phase reactions in free-standing layered M-Si (M=Ti, V, Cr, Co) filmsJournal of Applied Physics, 1988
- A kinetic model for solid-state silicide nucleationJournal of Applied Physics, 1987
- Amorphous Ti-Si alloy formed by interdiffusion of amorphous Si and crystalline Ti multilayersJournal of Applied Physics, 1987
- Anomalous first-phase formation in rapidly thermal annealed, thin-layered Si/Ni/Si filmsApplied Physics Letters, 1986
- Amorphous transition phase of NiSi2Applied Physics Letters, 1986
- The Glass Transition Phases in the Formation of PtSiPhysica Status Solidi (a), 1986
- Kinetics of formation of silicides: A reviewJournal of Materials Research, 1986
- Thermodynamic and kinetic aspects of the crystal to glass transformation in metallic materialsProgress in Materials Science, 1986
- Formation of an amorphous Rh-Si alloy by interfacial reaction between amorphous Si and crystalline Rh thin filmsApplied Physics Letters, 1983
- Growth kinetics of planar binary diffusion couples: ’’Thin-film case’’ versus ’’bulk cases’’Journal of Applied Physics, 1982