Group-Theoretical Study of the Zeeman Effect of Acceptors in Silicon and Germanium

Abstract
Group-theoretical techniques are used to deduce the selection rules, energy splittings, and relative intensities of the Zeeman components of the electric dipole absorption lines Γ8Γ6, Γ8Γ7, and Γ8Γ8 of an acceptor in a group-IV semiconductor. Results are obtained for three different orientations of the magnetic field B with respect to the crystal axes: B[001], B[111], and B[110]. For a Γ8Γ8 transition the relative intensities for B[001] are expressed in terms of two real parameters, which are essentially ratios of matrix elements of the electric-dipole-moment operator. The relative intensities for B[111] and B[110] depend on energy splittings as well. When terms quadratic in B are important, the relative intensities for B[110] become dependent on B. The results obtained are quite general, being based on symmetry considerations alone. They are applicable to an impurity located at a site of tetrahedral symmetry, provided that the Zeeman splitting of a given level is small in comparison with its distance from the nearest zero-field level. Our treatment proves particularly useful for studying acceptor states in group-IV semiconductors. As an example, we discuss the case of boron impurity in germanium.