Contrast enhanced photolithography

1 January 1983

journal article
Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters

Vol. 4 (1) , 14-16
https://doi.org/10.1109/EDL.1983.25629

Abstract

This paper introduces a new method, contrast enhancement, which improves the imaging properties of conventional photoresist through the use of a photobleachable layer applied to the resist surface. Contrast enhancement allows high contrast photopatterns to be formed even when low contrast illumination is used. A short discussion of the theory and an experimental demonstration of the method are presented.

Keywords

LITHOGRAPHY
RESISTS
CIRCUITS
SPATIAL RESOLUTION
FREQUENCY
OPTICAL IMAGING
OPTICAL MATERIALS
TRANSFER FUNCTIONS
PHOTOBLEACHING
LIGHTING

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