Improved RF integrated magnetic thin-film inductors by means of micro slits and surface planarization techniques
- 1 September 2000
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 36 (5) , 3495-3498
- https://doi.org/10.1109/20.908872
Abstract
Improvement of magnetic thin-film inductors for RF monolithic microwave integrated circuits (MMICs) is discussed. Surface planarization reduced the surface roughness down to R/sub a/=1.2 nm, which enhanced the quality factor by 14% over a nonplanarized inductor. The orthogonal bar slit pattern was the best among the fabricated slit patterns, L=7.55 nH (+12% of the air core), R=6.80 /spl Omega/ and Q=7.09 (+9%) were obtained for the orthogonal bar slit pattern (slit width=0.75 /spl mu/m) with surface planarization.Keywords
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