Chemically Amplified Resists. V Photochemical Proton Generation Mechanism from Triphenylsulfonium Salts.
- 1 January 1994
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 7 (3) , 483-486
- https://doi.org/10.2494/photopolymer.7.483
Abstract
Japan's largest platform for academic e-journals: J-STAGE is a full text database for reviewed academic papers published by Japanese societiesKeywords
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