Measurement of low-level strain birefringence in optical elements using a photoelastic modulator

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Abstract
Measurements of low levels of strain birefringence in fused silica glass have been made using a system based on a photoelastic modulator. Measurements of sample net retardation have been made with a resolution of 0.1 nanometers. Measured values of a strain birefringence constant for fused silica are in good agreement with established data.

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