Rugged surface polycrystalline silicon film deposition and its application in a stacked dynamic random access memory capacitor electrode
- 1 March 1996
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 14 (2) , 751-756
- https://doi.org/10.1116/1.588709
Abstract
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