Zum Substituenteneinfluß auf die UV-Empfindlichkeit der Naphthochinondiazid-Photolacke
- 1 October 1983
- journal article
- other
- Published by Wiley in Zeitschrift für Chemie
- Vol. 23 (10) , 376-377
- https://doi.org/10.1002/zfch.19830231008
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Ultrafast High-Resolution Contact Lithography with Excimer LasersIBM Journal of Research and Development, 1982
- Untersuchung der sensibilisierten Photolyse von 2‐Diazo‐1‐oxo‐1,2‐dihydronaphthalenen in fester SchichtJournal für Praktische Chemie, 1982
- Photochemical Decomposition Mechanisms for AZ-Type PhotoresistsIBM Journal of Research and Development, 1979