Effects of process errors on the diffraction characteristics of binary dielectric gratings
- 10 May 1995
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 34 (14) , 2430-2435
- https://doi.org/10.1364/ao.34.002430
Abstract
The effects of fabrication errors on the predicted performance of surface-relief phase gratings are analyzed with a rigorous vector diffraction technique. For binary elements, errors in the dimensions of the profile [depth, linewidth (fill factor), and grating period], as well as errors in the shape of the profile, are investigated. It is shown that the dimension errors do not have a significant effect on grating performance when the grating is designed for either maximum or minimum diffraction efficiency. A trapezoid is used to model the shape error of the profile. For the first time, design rules that significantly reduce the effects of any shape error are presented.Keywords
This publication has 6 references indexed in Scilit:
- Design and fabrication of high-efficiency beam splitters and beam deflectors for integrated planar micro-optic systemsApplied Optics, 1993
- Analysis and applications of optical diffraction by gratingsProceedings of the IEEE, 1985
- Diffraction analysis of dielectric surface-relief gratingsJournal of the Optical Society of America, 1982
- The Dielectric Lamellar Diffraction GratingOptica Acta: International Journal of Optics, 1981
- Fourier treatment of near-field scalar diffraction theoryAmerican Journal of Physics, 1979
- Coupled Wave Theory for Thick Hologram GratingsBell System Technical Journal, 1969