Granular Nix (SiO2)100−x thin films as low temperature thermometers
- 15 September 1990
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 68 (6) , 3015-3017
- https://doi.org/10.1063/1.346410
Abstract
A series of granular Nix (SiO2)100−x thin films have been prepared by rf sputtering with nickel concentrations between 60 and 90 at. %. The temperature dependence of the resistance is strongly composition dependent. In films with Ni concentrations below 70%, the resistance increases as the temperature decreases, but shows a crossover to a weaker temperature dependence below about 1 K. The magnetoresistance of these materials is small and negative in applied magnetic fields up to 6 T. The temperature dependence of the resistance and the small magnetoresistance indicate that films with Ni concentrations near 66% may be useful for thermometry over a wide range of temperatures.This publication has 6 references indexed in Scilit:
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