Hardness and grain size relations for thick chromium films deposited by hallow cathode discharge
- 1 September 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 45 (3) , 473-479
- https://doi.org/10.1016/0040-6090(77)90234-6
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Applications of wear-resistant thick films formed by physical vapor deposition processesThin Solid Films, 1977
- Adhesion study of silver films deposited from a hot hollow-cathode sourceJournal of Vacuum Science and Technology, 1976
- Physical vapor deposition of thick Cr and its carbide and nitride films by hollow-cathode dischargeJournal of Vacuum Science and Technology, 1976
- Structure and property relationships of Ni−20Cr produced by high−rate physical vapor depositionJournal of Vacuum Science and Technology, 1975
- Thermal input to substrate during deposition by hollow−cathode dischargeJournal of Vacuum Science and Technology, 1975
- Characterization of silver coatings deposited from a hollow cathode sourceJournal of Vacuum Science and Technology, 1974
- The effect of substrate bias voltage on the bonding of evaporated silver coatingsJournal of Vacuum Science and Technology, 1974
- Production and Measurement of Dense Metal Ions for Physical Vapor Deposition by a Hollow Cathode DischargeJapanese Journal of Applied Physics, 1974
- Vacuum coating with a hollow cathode sourceJournal of Vacuum Science and Technology, 1974
- High Rate Ion Production for Vacuum DepositionJournal of Vacuum Science and Technology, 1972