Humidity-sensitive AlCSiOxpSiAl structures
- 1 November 1985
- journal article
- Published by Elsevier in Sensors and Actuators
- Vol. 8 (3) , 245-249
- https://doi.org/10.1016/0250-6874(85)85007-1
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Basic properties of metal/insulator/semiconductor structures containing borazone and diamond layers produced by the reactive pulse plasma methodThin Solid Films, 1983
- Bonding in hydrogenated hard carbon studied by optical spectroscopySolid State Communications, 1983
- A chemically sensitive MOS element with an ultra thin dielectric filmThin Solid Films, 1981
- Conduction in thin dielectric filmsJournal of Physics D: Applied Physics, 1971