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A new process for one micron and finer CMOS
Home
Publications
A new process for one micron and finer CMOS
A new process for one micron and finer CMOS
RM
R.A. Martin
R.A. Martin
AL
A.G. Lewis
A.G. Lewis
TH
T.Y. Huang
T.Y. Huang
JC
J.Y. Chen
J.Y. Chen
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1 January 1985
proceedings article
Published by
Institute of Electrical and Electronics Engineers (IEEE)
https://doi.org/10.1109/iedm.1985.190986
Abstract
No abstract available
Keywords
NEW PROCESS
PROCESS FOR ONE MICRON
MICRON AND FINER CMOS
Cited
Cited by 7 articles
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