A novel high-accuracy microstereolithography method employing an adaptive electro-optic mask
- 22 November 2000
- journal article
- Published by Elsevier in Journal of Materials Processing Technology
- Vol. 107 (1-3) , 167-172
- https://doi.org/10.1016/s0924-0136(00)00672-5
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Holographic characterization of epoxy resins at 351.1 nmOptical Engineering, 1998
- Study of the spatial resolution of a new 3D microfabrication process: the microstereophotolithography using a dynamic mask-generator techniqueJournal of Photochemistry and Photobiology A: Chemistry, 1997