Effects of Oxygen Partial Pressure and Substrate Temperature on Crystalline Orientation in Y-Ba-Cu-O Films Prepared by Sputtering

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Abstract
The dependence of crystalline orientation in Y-Ba-Cu-O films on oxygen partial pressure and substrate temperature has been investigated for films prepared by magnetron sputtering on (100) SrTiO3 and (100) MgO substrates. The tendencies for preferential orientation were the same on both substrates. At low oxygen pressures, the c-axis was oriented perpendicularly to the film plane. In contrast, a/c-axis oriented films were formed at intermediate oxygen pressures, and the a-axis was oriented at high oxygen pressures. At higher temperatures, c-axis oriented films were formed, even at high oxygen pressures.