Activation Energy and Annealing Kinetics of Remanence Growth Caused by Low-Temperature Magnetic Anneal of Electron-Irradiated Nickel-Iron
- 1 February 1968
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 39 (2) , 991-992
- https://doi.org/10.1063/1.1656362
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Energy Dependence of Magnetic Changes Induced by Electron IrradiationJournal of Applied Physics, 1967
- Uniaxial Anisotropy Induced by a Low-Temperature Magnetic Anneal Following Electron IrradiationJournal of Applied Physics, 1966
- Uniaxial anisotropy by "radiomagnetic" treatment; controlling factors in a new processIEEE Transactions on Magnetics, 1965
- Electrical Resistivity Study of Lattice Defects Introduced in Copper by 1.25-Mev Electron Irradiation at 80°KPhysical Review B, 1956