Photogenerators of Sulfamic Acids; Use in Chemically Amplified Single Layer Resists.

• 1 January 1998
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 11  (3) , 419-429
• https://doi.org/10.2494/photopolymer.11.419

Abstract

Keywords

• PHOTOGENERATORS
• CHEMICALLY AMPLIFIED
• AMPLIFIED SINGLE
• SULFAMIC ACIDS
• LAYER RESISTS