Short Channel MOS FET's Fabricated by Self-Aligned Ion Implantation and Laser Annealing
- 1 January 1980
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 19 (S1)
- https://doi.org/10.7567/jjaps.19s1.129
Abstract
Short channel MOS FET's are successfully fabricated by a combination of selfaligned ion implantation and laser annealing, both of poly-Si gate electrodes. The threshold voltage vs. gate length relation and the overlapping capacitance between gate and drain are improved as a result of the extremely small lateral diffusion of implanted atoms.Keywords
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