Electrodeposition of copper on a copper single crystal (100) face in the presence of iodide ions
- 31 January 1977
- journal article
- Published by Elsevier in Surface Technology
- Vol. 5 (1) , 49-56
- https://doi.org/10.1016/0376-4583(77)90040-1
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Crystal growth at the cathodeElectrodeposition and Surface Treatment, 1975
- Electrodeposition of copper on a copper single crystal (111) face in the presence of bromide ionsElectrodeposition and Surface Treatment, 1975
- Electrodeposition of copper on a copper single crystal (111) face in the presence of chloride ionsElectrodeposition and Surface Treatment, 1975
- Electrodeposition of copper on a copper single crystal (111) plane in the presence of iodide ionsElectrodeposition and Surface Treatment, 1975
- Growth of Cu2Cl2 and Cu2Br2 on single crystal faces and polycrystalline copper during dissolution in CuSO4 + H2SO4Proceedings of the Indian Academy of Sciences - Section A, 1970
- Electrodeposition of copper on copper single crystal (100) face in presence of chloride ionsProceedings of the Indian Academy of Sciences - Section A, 1968
- Zu Einsteins Ableitung des Planckschen StrahlungsgesetzesThe European Physical Journal A, 1925