Electron-beam-induced diffusion during thin-film depth profiling
- 1 June 1979
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 50 (6) , 4422-4424
- https://doi.org/10.1063/1.326433
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Auger study of preferred sputtering on binary alloy surfacesSurface Science, 1976
- Electron-beam effects in depth profiling measurements with Auger electron spectroscopyJournal of Applied Physics, 1975
- Electron beam effects in auger analysis of physisorbed xenonSurface Science, 1975