FTIR Studies of the Adsorption/Desorption Behavior of Copper Chemical Vapor Deposition Precursors on Silica. 1. Bis(1,1,1,5,5,5-hexafluoroacetylacetonato)copper(II)
- 1 July 1994
- journal article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry
- Vol. 98 (27) , 6753-6762
- https://doi.org/10.1021/j100078a017
Abstract
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