Temperature and thickness dependence of low temperature transport in amorphous silicon thin films: A comparison to amorphous germanium
- 1 December 1975
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 17 (11) , 1431-1433
- https://doi.org/10.1016/0038-1098(75)90619-5
Abstract
No abstract availableKeywords
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