Deep etch lithography at LURE-D.C.I. storage ring

Publisher Website
Google Scholar
Abstract
LIGA technique has proved to be a powerful tool for micro-fabrication mass production. French laboratories (LURE, L2M, LPMO) gathered to introduce this new technology at LURE facilities. In this paper are described the different steps of the deep etch lithography process including mask realization and first pseudo-tridimensional resist structures are shown

This publication has 0 references indexed in Scilit: