100 kV electron beam lithography using a Schottky field emission source

• 1 November 1994
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 12  (6) , 3409-3412
• https://doi.org/10.1116/1.587522

Abstract

Keywords

• KV ELECTRON
• EMISSION SOURCE
• SCHOTTKY FIELD
• BEAM LITHOGRAPHY
• LITHOGRAPHY USING
• FIELD EMISSION