Applications of a Micro X-Ray Spectrometer and a Computer Simulator for Stress Analyses in Al Interconnections
- 1 November 1989
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 28 (11A) , L2065
- https://doi.org/10.1143/jjap.28.l2065
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Development of an Innovative 5 µm φ Focused X-Ray Beam Energy-Dispersive Spectrometer and its ApplicationsJapanese Journal of Applied Physics, 1988
- Stress-induced grain boundary fractures in Al–Si interconnectsJournal of Vacuum Science & Technology B, 1987
- The influence of internal stresses in tungsten-gate electrodes on the degradation of MOSFET characteristics caused by hot carriersIEEE Transactions on Electron Devices, 1987
- X-ray guide tube for diffraction experimentsJournal of Applied Crystallography, 1983