Characteristics of thin chromium films obtained by different methods of deposition
- 1 December 1984
- Vol. 34 (12) , 1061-1065
- https://doi.org/10.1016/0042-207x(84)90224-0
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Iron Oxide—An Inorganic Photoresist and Mask MaterialJournal of the Electrochemical Society, 1974
- The evaporation of metals and elemental semiconductors using a work-accelerated electron beam sourceVacuum, 1969
- Determination of the Absolute Phase Change on Reflection at Chromium FilmsJournal of the Optical Society of America, 1964