Ultraviolet light imprinted sol-gel silica glass low-loss waveguides for use at 1.55 μm

Abstract
The fabrication and characterization of UV-light-imprinted sol-gel silica glass waveguides on glass and silicon substrates are described. Waveguide fabrication parameters are evaluated. Appropriate combinations of UV light exposure time, sol-gel film thickness, and postbake time produce waveguides suitable for use at a 1.55-μm wavelength. Propagation losses in these waveguides are less than 0.3 dB/cm. © 1997 Society of Photo-Optical Instrumentation Engineers.

This publication has 0 references indexed in Scilit: