Preparation of PbTiO3 Ferroelectric Thin Film by Chemical Vapor Deposition
- 1 October 1982
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 21 (10A) , L655-656
- https://doi.org/10.1143/jjap.21.l655
Abstract
Chemical vapor deposition of PbTiO3 thin film on the substrate of Pt plate has been successfully made. (100)- and (001)-oriented PbTiO3 film has been obtained under a certain deposition condition. Surface of the film is smoother and the deposition rate of 8.3 µm/h is much higher, as compared with those of conventional sputtering method.Keywords
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