Structural and Electrical Properties of Sputtered CrNi Films

Abstract
The resistivity, temperature coefficient of resistance (TCR) and the crystal structure of CrNi films were studied in the composition range of 10–90% Cr, balance Ni. The films were triode sputtered on glass substrates at temperatures below 80 °C. In addition the influence of alloying with Si, Mo, and Al has been investigated. A new metastable phase of unknown structure is reported. The experiments show that the resistivity and TCR are insensitive to the Cr content except for samples containing 10% and 90% Cr and insensitive to the crystal structure.