Substrate Effects on the Kinetics of Solid Phase Crystallization In a-Si
- 1 January 1991
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Large grain polycrystalline silicon by low-temperature annealing of low-pressure chemical vapor deposited amorphous silicon filmsJournal of Applied Physics, 1988
- The Effect of Low Pressure on the Structure of LPCVD Polycrystalline Silicon FilmsJournal of the Electrochemical Society, 1987
- Recrystallization of amorphized polycrystalline silicon films on SiO2: Temperature dependence of the crystallization parametersJournal of Applied Physics, 1987