Chemically assisted sputter etching of permalloy using CO or CL2

• 1 July 1986
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology A
• Vol. 4  (4) , 1841-1849
• https://doi.org/10.1116/1.573775

Abstract

Keywords

• ETCH
• CL2
• PERMALLOY
• ASSISTED SPUTTER
• ADSORPTION
• Å/MIN
• ARGON
• REDEPOSITION