DC plasma etching of silicon by sulfur hexafluoride. Mass spectrometric study of the discharge products
- 1 June 1981
- journal article
- research article
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 1 (2) , 201-215
- https://doi.org/10.1007/bf00564581
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
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