Ambipolar drift-length measurement in amorphous hydrogenated silicon using the steady-state photocarrier grating technique
- 15 December 1986
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 34 (12) , 9031-9033
- https://doi.org/10.1103/physrevb.34.9031
Abstract
The steady-state photocarrier grating technique, which yields the ambipolar diffusion length in photoconductive insulators, can also yield the ambipolar drift length if the measurements are carried out as a function of electric field. This characteristic length in turn gives a lower bound on the experimental value of the minority-carrier drift length. From measurements of both the diffusion and drift length on the same sample of amorphous hydrogenated silicon it is found that the ratio between the ambipolar diffusion coefficient and the ambipolar mobility is equal to about twice the classical Einstein value.Keywords
This publication has 3 references indexed in Scilit:
- Steady-state photocarrier grating technique for diffusion length measurement in photoconductive insulatorsApplied Physics Letters, 1986
- Intensity dependence of diffusion length in amorphous silicon by surface photovoltage measurementsJournal of Applied Physics, 1984
- Intensity dependence of the minority-carrier diffusion length in amorphous silicon based alloysJournal of Applied Physics, 1984