Analysis of GaAs using a combined r.f. glow discharge and inductively coupled plasma source mass spectrometer
- 1 June 1997
- journal article
- Published by Elsevier in International Journal of Mass Spectrometry and Ion Processes
- Vol. 164 (1-2) , 81-91
- https://doi.org/10.1016/s0168-1176(97)00021-9
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- The use of a secondary cathode to analyse solid non-conducting samples with direct current glow discharge mass spectrometry: potential and restrictionsAnalytical and Bioanalytical Chemistry, 1996
- Radio-frequency glow discharge ion source for high resolution mass spectrometryAnalytical and Bioanalytical Chemistry, 1995
- Characterization and optimization of a radiofrequency glow discharge ion source for a high resolution mass spectrometerJournal of Analytical Atomic Spectrometry, 1995
- Comparison between direct current and radiofrequency glow discharge mass spectrometry for the analysis of oxide-based samplesJournal of Analytical Atomic Spectrometry, 1995
- rf-Powered glow discharges. Elemental analysisAnalytical Chemistry, 1994
- Radiofrequency powered glow discharges for emission and mass spectrometry: operating characteristics, figures of merit and future prospectsJournal of Analytical Atomic Spectrometry, 1994
- Analysis of aluminium alloys using inductively coupled plasma and glow discharge mass spectrometryJournal of Analytical Atomic Spectrometry, 1994
- Analysis of Nonconducting Sample TypesPublished by Springer Nature ,1993
- Design and characterization of glow discharge devices as complementary sources for an “ICP” mass spectrometerSpectrochimica Acta Part B: Atomic Spectroscopy, 1991
- Jet-enhanced sputtering cell as an ion source for mass spectrometryAnalytical Chemistry, 1990