Plasma filament ion source for high current implanter
- 1 January 1987
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 21 (1-4) , 190-193
- https://doi.org/10.1016/0168-583x(87)90823-8
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Plasma filament ion sourceVacuum, 1986
- An ion source with plasma generatorNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- C.M.O.S. devices fabricated on buried SiO 2 layers formed by oxygen implantation into siliconElectronics Letters, 1978
- Study of the characteristics of the ion beam extracted from an rf discharge in hydrogen under conditions of resonanceJournal of Applied Physics, 1974
- A new ion source for electromagnetic isotope separatorsNuclear Instruments and Methods, 1963