Nucleation and growth of silicon on SiO2 during SiH4 low pressure chemical vapor deposition as studied by hydrogen desorption titration
- 1 July 1992
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 10 (4) , 869-873
- https://doi.org/10.1116/1.577686
Abstract
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