Das Niederdruckplasma
- 1 November 1991
- journal article
- research article
- Published by Wiley in Vakuum in Forschung und Praxis
- Vol. 3 (4) , 274-281
- https://doi.org/10.1002/vipr.2230030407
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Experimental and design information for calculating impedance matching networks for use in rf sputtering and plasma chemistryVacuum, 1979
- Positive-ion bombardment of substrates in rf diode glow discharge sputteringJournal of Applied Physics, 1972
- Application of RF Discharges to SputteringIBM Journal of Research and Development, 1970
- VII. On the electro-chemical polarity of gasesPhilosophical Transactions of the Royal Society of London, 1852