Calculations of thermalization during the sputter deposition process
- 1 October 1984
- Vol. 34 (10-11) , 987-990
- https://doi.org/10.1016/0042-207x(84)90183-0
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Monte Carlo simulation of the particle transport process in sputter depositionThin Solid Films, 1984
- Stress and property control in sputtered metal films without substrate biasThin Solid Films, 1983
- Plasma-assisted deposition processes: Theory, mechanisms and applicationsThin Solid Films, 1983
- Evolve, a time-dependent monte carlo code to simulate the effects of ion-beam-induced atomic mixingRadiation Effects, 1981
- Energetic binary collisions in rare gas plasmasJournal of Vacuum Science and Technology, 1979
- Internal stresses in sputtered chromiumThin Solid Films, 1977
- High‐rate magnetron sputtering of high Tc Nb3Sn filmsJournal of Vacuum Science and Technology, 1977
- Selective thermalization in sputtering to produce high TcfilmsIEEE Transactions on Magnetics, 1975
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974
- II. The energy spectrum of ejected atoms during the high energy sputtering of goldPhilosophical Magazine, 1968