Measurement of electron energy deposition necessary to form an anode plasma in Ta, Ti, and C for coaxial bremsstrahlung diodes
- 1 July 1989
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 66 (1) , 10-22
- https://doi.org/10.1063/1.343913
Abstract
Measurements are made of surface doses necessary to initiate an anode plasma by electron bombardment of Ta, Ti, and C anodes for coaxial geometries characteristic of high-power electron-beam diodes. Measured lower and upper bounds of doses necessary to form an anode plasma are 54±7–139±16 J/g in Ta, 214±23–294±71 J/g in Ti, and 316±33–494±52 J/g in C. Within these bounds, probable values for the threshold are given under specific assumptions. The measurements are consistent with a thermal desorption model for plasma formation.This publication has 18 references indexed in Scilit:
- Impedance of an annular-cathode indented-anode electron diode terminating a coaxial magnetically insulated transmission lineJournal of Applied Physics, 1988
- Improved bremsstrahlung radiation uniformity from an indented-anode diodeApplied Physics Letters, 1987
- Characterization of electron and ion current flow in very large aspect-ratio terawatt diodes employing heated and unheated anodesApplied Physics Letters, 1978
- Relativisitic electron beam pinch formation processes in low impedance diodesPhysics of Fluids, 1977
- Diagnostics for intense pulsed ion beamsReview of Scientific Instruments, 1977
- The characteristics of a medium current relativistic electron-beam diodeJournal of Applied Physics, 1977
- Two-dimensional ion effects in relativistic diodesJournal of Vacuum Science and Technology, 1975
- Observation of anode ions associated with pinching in a relativistic electron beam diodeJournal of Applied Physics, 1975
- Relativistic Brillouin flow in the high ν/γ diodeJournal of Applied Physics, 1975
- Plasma-induced field emission and the characteristics of high-current relativistic electron flowJournal of Applied Physics, 1974