Kinetics of WSi2 formation at low and high temperatures
- 1 June 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 140 (1) , 23-28
- https://doi.org/10.1016/0040-6090(86)90155-0
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Formation and characterization of tungsten silicide layersThin Solid Films, 1985
- Calculation of solid-phase reaction rates induced by a scanning cw laserJournal of Applied Physics, 1980
- Reaction kinetics of tungsten thin films on silicon (100) surfacesJournal of Applied Physics, 1973