Doping effects in a-Si:H/a-Si1−xNx:H superlattices
- 1 December 1985
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 77-78, 1089-1092
- https://doi.org/10.1016/0022-3093(85)90847-6
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Properties of amorphous semiconducting multilayer filmsJournal of Non-Crystalline Solids, 1984
- Amorphous Semiconductor SuperlatticesPhysical Review Letters, 1983
- Optical Properties of a-Si:H Ultrathin LayersJapanese Journal of Applied Physics, 1983
- Substitutional Doping of a-SixNi1-x: HJapanese Journal of Applied Physics, 1982
- Thickness and temperature dependence of the conductivity of phosphorus-doped hydrogenated amorphous siliconPhilosophical Magazine Part B, 1980