Anisotropic etching during negative ion resputtering

• 1 May 1985
• journal article
• Published by Elsevier in Applied Surface Science
• Vol. 22-23, 111-117
• https://doi.org/10.1016/0169-4332(85)90042-x

Abstract

Keywords

• ANISOTROPIC ETCHING
• NEGATIVE ION RESPUTTERING
• ETCHING DURING NEGATIVE